Plasma etching: Yesterday, today, and tomorrow
作者： Vincent M. Donnelly , Avinoam Kornblit
DOI: 10.1116/1.4819316
关键词: Etching (microfabrication) 、 Plasma etching 、 Silicon dioxide 、 Silicon 、 Nanotechnology 、 Plasma 、 Sputtering 、 Integrated circuit 、 Chemistry 、 Silicon nitride 、 Surfaces, Coatings and Films 、 Surfaces and Interfaces 、 Condensed matter physics
摘要: … The field of plasma etching is reviewed. Plasma etching, a revolutionary extension of the … Quickly, the ability to anisotropically etch silicon, aluminum, and silicon dioxide in plasmas …
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