Focused ion beam repair: staining of photomasks and reticles
作者： P D Prewett , G M Sundaram
DOI: 10.1088/0022-3727/26/7/021
关键词: Quartz substrate 、 Stain 、 Wavelength 、 Staining 、 Optics 、 Reticle 、 Absorption (electromagnetic radiation) 、 Focused ion beam 、 Materials science 、 Photomask
摘要: Focused ion beam (FIB) repair of chromium defects on photomasks and reticles leaves a post stain in the quartz substrate. The wavelength dependent absorption properties typical stained regions have been measured, showing transition losses up to 80% deep UV. A simple model is good qualitative agreement with experimental results.
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