Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object

作者: Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal

DOI:

关键词: Artificial intelligencePosition sensorObject (computer science)Compensation (engineering)SignalFrame (networking)EngineeringPosition (vector)System of measurementMountComputer vision

摘要: An encoder-type measurement system is configured to measure a position dependent signal of movable object, the including at least one sensor mountable on object target substantially stationary frame, and mounting device mount frame. The further includes compensation compensate movements and/or deformations with respect may include passive or an active damping feedback control system. In alternative embodiment, gripping which fixes during high accuracy movement object.

参考文章(28)
Ninghui Zhu, Jim Beattie, Ian Turner, Thermally stable mounting for a diffraction grating device ,(2000)
Yim-Bun Patrick Kwan, Optical imaging arrangement ,(2006)
Joe Sakai, Marcel Hendrikus Maria Beems, Lithographic apparatus and positioning apparatus ,(2006)
Richard J. H. Du Croo de Jongh, Jacob F. F. Klinkhamer, Theodorus M. Modderman, Gerrit J. Nijmeijer, Marcus E. J. Boonman, Thomas J. M. Castenmiller, Erik R. Loopstra, Nicolaas A. A. J. van Asten, Johannes C. M. Jasper, Frederik T. E. Heuts, Jacobus Gemen, Off-axis levelling in lithographic projection apparatus ,(2003)
Alexander Matthijs Struycken, Michael Jozef Mathijs Renkens, Martinus Cornells Maria Verhagen, Ruben Jan Kok, Lithographic apparatus, measurement system, and device manufacturing method ,(2004)
Jozef Petrus Henricus Benschop, Erik Roelof Loopstra, Marinus Aart Van Den Brink, Dual stage lithographic apparatus and device manufacturing method ,(2005)
Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Wouter Onno Pril, Position measurement system and lithographic apparatus ,(2006)
Richard L. Sandstrom, William N. Partlo, John Martin Algots, James K. Howey, Richard G. Morton, Thomas A. Yager, John Dunlop, Raymond F. Cybulski, Xiaojiang Pan, Tom A. Watson, Firas F. Putris, Joshua C. Brown, Duv light source optical element improvements ,(2005)