Method for flattening magnetic tunnel junction bottom electrode by gas cluster ion beams
作者： Zhang Yunsen
DOI:
关键词: Ion 、 Irradiation 、 Sputtering 、 Magnetoresistive random-access memory 、 Materials science 、 Electrode 、 Tunnel magnetoresistance 、 Surface roughness 、 Optoelectronics 、 Flattening
摘要: The invention provides a method for flattening magnetic tunnel junction bottom electrode by gas cluster ion beams. beams are used to flatten the electrode, so that average surface roughness of reaches requirement deposing film. Due transverse sputtering effect low-energy beams, local unevenness can be eliminated effectively, optimal is obtained changing incident dosage, irradiation angel and/or adding organic alcohol, acid or aldehyde and like, filming quality magnetic/electrical performance improved, yield rate an MRAM loop improved; GCIB PVD canbe integrated into one system, technical complexity reduced, pollution caused addition CMP post cleaning technology avoided, especially suitable large-scale production MRAM.
lens.org 参考文章(11)
Kenji Kawai, Method of dry-etching a multi-layer film material ,(2003)
Daisuke Saida, Yuichi Ohsawa, Hiroaki Yoda, Kyoichi Suguro, Shigeki Takahashi, Junichi Ito, Method of manufacturing magnetic memory ,(2011)
Emmanuel Bourelle, Akinobu Sato, Toshio Seki, Akiko Suzuki, Takaaki Aoki, Jiro Matsuo, Method and device for flattening surface of solid ,(2004)
Akira Yamaguchi, Ryo Hinoura, Noriaki Toyoda, Ken-ichi Hara, Isao Yamada, Gas Cluster Ion Beam Etching under Acetic Acid Vapor for Etch-Resistant Material Japanese Journal of Applied Physics. ,vol. 52, pp. 05EB05- ,(2013) , 10.7567/JJAP.52.05EB05
Takanori Suda, Noriaki Toyoda, Ken-ichi Hara, Isao Yamada, Development of Cu Etching Using O$_{2}$ Cluster Ion Beam under Acetic Acid Gas Atmosphere Japanese Journal of Applied Physics. ,vol. 51, pp. 08HA02- 71 ,(2012) , 10.1143/JJAP.51.08HA02
Noriaki Toyoda, Isao Yamada, Gas Cluster Ion Beam Equipment and Applications for Surface Processing IEEE Transactions on Plasma Science. ,vol. 36, pp. 1471- 1488 ,(2008) , 10.1109/TPS.2008.927266
Jiro Matsuo, Akinobu Sato, Toshio Seki, Akiko Suzuki, Emmanuel Bourelle, Method of planarizing solid surface with gas cluster ion beam and solid surface planarizing apparatus ,(2007)
Jiro Matsuo, Akinobu Sato, Toshio Seki, Akiko Suzuki, Emmanuel Bourelle, Method for flattening solid surface with gas cluster ion beam, and solid surface flattening device ,(2007)
Kenichi Hara, 山田 公, 豊田 紀章, Noriaki Toyoda, Isao Yamada, 謙一 原, Planarization method, substrate processing system, and memory manufacturing method ,(2014)