作者: Nathaniel S. Wilson , Stephan Kraemer , Daniel J. Pennachio , Patrick Callahan , Mihir Pendharkar
DOI: 10.1103/PHYSREVMATERIALS.4.066003
关键词: Optoelectronics 、 Self assembled 、 Nanowire 、 Materials science 、 Kinetics 、 Scanning tunneling microscope 、 Molecular beam epitaxy 、 Surface energy 、 Electron 、 Transmission electron microscopy
摘要: We report a novel growth mechanism that produces in-plane [1-10] oriented ErSb nanowires formed during codeposition of Er0.3Ga0.7Sb via molecular beam epitaxy (MBE). Nanowires are characterized by in-situ scanning tunneling microscopy (STM), as well ex-situ transmission electron (TEM) and channeling contrast imaging (ECCI). show complexes macrosteps with step heights on the order 7 nm form nanowire growth. The shown to be part process directly responsible for observed stratified distribution nanowires. TEM indicates initial results in out-of-plane transitioning after critical film thickness. A surface energy model is put forward shows thickness due minimization GaSb{110} surfaces Kinetics transition discussed respect features STM, along material parameters needed achieve