Mechanism for Embedded In-plane Self Assembled Nanowire Formation

作者: Nathaniel S. Wilson , Stephan Kraemer , Daniel J. Pennachio , Patrick Callahan , Mihir Pendharkar

DOI: 10.1103/PHYSREVMATERIALS.4.066003

关键词: OptoelectronicsSelf assembledNanowireMaterials scienceKineticsScanning tunneling microscopeMolecular beam epitaxySurface energyElectronTransmission electron microscopy

摘要: We report a novel growth mechanism that produces in-plane [1-10] oriented ErSb nanowires formed during codeposition of Er0.3Ga0.7Sb via molecular beam epitaxy (MBE). Nanowires are characterized by in-situ scanning tunneling microscopy (STM), as well ex-situ transmission electron (TEM) and channeling contrast imaging (ECCI). show complexes macrosteps with step heights on the order 7 nm form nanowire growth. The shown to be part process directly responsible for observed stratified distribution nanowires. TEM indicates initial results in out-of-plane transitioning after critical film thickness. A surface energy model is put forward shows thickness due minimization GaSb{110} surfaces Kinetics transition discussed respect features STM, along material parameters needed achieve

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