作者: Christopher H. Becker
DOI: 10.1007/978-1-4615-3708-3_4
关键词: Atomic physics 、 Charged particle 、 Materials science 、 Secondary ion mass spectrometry 、 Sputtering 、 Ion 、 Characterization (materials science) 、 Photoionization mode 、 Photoionization 、 Mass spectrometry
摘要: This chapter deals with photoionization of atoms and molecules sputtered from a surface under vacuum. In order to understand the origin motivation work discussed here, first note initial experiments on sputtering performed in 1910 by J.J. Thomson.(1) that early Thomson cathode noted some sputterd were charged state while majority neutral charge. After many years general inactivity field, beginning late 1950’ Honig(2,3) began developing solids as means materials chemical characterization using particles driven surface, so-called secondary ions. The use ions analysis has flourished intervening years.(4–6) ion mass spectrometry (SIMS) technique became popular because its sensitivity, also, not experimentally trivial, it was relatively straightforward bombard sample (primary) beam examine those directly spectrometer.