Particle reducing method and film deposition method
作者： Hiroyuki Kikuchi , Hitoshi Kato , Takeshi Kumagai
DOI:
关键词: Plasma 、 Susceptor 、 High Frequency Waves 、 Particle 、 Chemistry 、 Optoelectronics 、 Substrate (printing) 、 Vacuum chamber 、 Analytical chemistry 、 Deposition (phase transition)
摘要: A particle reducing method includes a step of supplying first gas to vacuum chamber in which susceptor, formed by an insulating object and the surface is provided with substrate mounting portion, rotatably provided; generating plasma from high frequency waves device for chamber; exposing on not mounted, while rotating susceptor.
lens.org 参考文章(3)
Shoji Den, Nobuo Ishii, Masaru Hori, Toshio Goto, Plasma source and plasma processing apparatus ,(2004)
Akira Shimizu, Young-Duck Tak, Hyung-Sang Park, Wonyong Koh, Semiconductor-processing apparatus with rotating susceptor ,(2006)
Hitoshi Kato, Shigenori Ozaki, Takeshi Kumagai, Film deposition apparatus, film deposition method, and computer program storage medium ,(2011)