Plasma source and plasma processing apparatus
作者： Shoji Den , Nobuo Ishii , Masaru Hori , Toshio Goto
DOI:
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摘要: A plasma source (1) is composed of a chamber (2) to which gas supplied and hollow cathode member (4) arranged on the flow-out side has plurality electrode holes (3) through flows. In such (1), microcathode discharge can occur within (4).
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