APPARATUS FOR FORMING AMORPHOUS SEMICONDUCTOR THIN FILM

作者: Sakai Hiroshi

DOI:

关键词: SilaneAmorphous siliconPlasmaDopingAnodeCathodeMaterials scienceInsulator (electricity)OptoelectronicsThin film

摘要: PURPOSE:To enhance the doping efficiency by independently supplying a gas for forming an amorphous silicon film separately from silane of main material gas. CONSTITUTION:A DC discharge is generated power supplied source 12 between enamelled cathodes 9 made hollow cylindrical metal and mesh anode 11 to generate plasma 10. Gas independent inlet tubes 7 through insulator connecting 17 into 9. The efficiently ionized in high density negative glow 10 cathodes, deposited on substrate 3.

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