Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof
作者： Frank-Holm Roegner , Goesta Mattausch , Haydn N. G. Wadley , Henry Morgner
DOI:
关键词: Plasma 、 Plume 、 Chemical vapor deposition 、 Cathode 、 Coaxial 、 Plasma processing 、 Optoelectronics 、 Chemistry 、 Electron beam physical vapor deposition 、 Analytical chemistry 、 Jet (fluid)
摘要: A plasma generation process that is more optimized for vapor deposition processes in general, and particularly directed processing. The features of such an approach enables a robust reliable coaxial capability which the jet with plume, rather than orthogonal configuration creating previous disadvantages. In this way, deformation gas by work stream hollow cathode pipe can be avoided carrier consumption needed shaping plume significantly decreased.
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