Fabrication of advanced targets for laser driven nuclear fusion reactions through standard microelectronics technology approaches

摘要: Silicon targets enriched with hydrogen and doped boron at high atomic concentration (1020–1022 cm−3) were designed fabricated using ion implantation thermal diffusion processes to be used for experiments in the field of laser driven nuclear fusion. Two main types target prepared: thin (2 μ m) foils thick (500 slabs. Such irradiated a sub-nanosecond, kJ-class moderate intensity (~ 1016 W/cm2) trigger p(11B,α)2α fusion reaction thanks acceleration proton streams energy 0.1–1 MeV . The combination ad-hoc developed given pulse parameters allowed generate very flux alpha particles (107–109/sr per shot). paper mainly focuses on microfabrication techniques optimized fabrication such advanced comparison key results achieved different experiment. Hydrodynamic simulations are also discussed.