In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water
作者： Antti Rahtu , Teemu Alaranta , Mikko Ritala
DOI: 10.1021/LA010103A
关键词: Quadrupole 、 Atomic layer deposition 、 Quadrupole mass analyzer 、 Reaction mechanism 、 Atmospheric temperature range 、 Quartz crystal microbalance 、 Kinetic energy 、 Analytical chemistry 、 Mass spectrometry 、 Chemistry
摘要: Reaction mechanisms in the atomic layer deposition of Al2O3 from Al(CH3)3 and water were studied with a quartz crystal microbalance at 150−350 °C quadrupole mass spectrometer 150−400 °C. The growth rate was highest 250 At lower temperatures limited due to kinetic reasons higher amount surface −OH groups. About half ligands released during pulse other pulse. reaction temperature had no marked effect on mechanisms, range studied.
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