Direct molding of nanopatterned polymeric films: Resolution and errors
作者： O. Azzaroni , P. L. Schilardi , R. C. Salvarezza , R. Gago , L. Vázquez
DOI: 10.1063/1.1537867
关键词: Resolution (electron density) 、 Silicon 、 Lateral resolution 、 Nanotechnology 、 Polymer 、 Composite material 、 Atomic force microscopy 、 Surface structure 、 Polystyrene 、 Materials science 、 Molding (process)
摘要: The capability of the direct polymer molding method to transfer ordered nanopatterns from a surface-modified silicon template polymeric materials, such as polystyrene (PS) and high-impact (HIPS) is investigated by tapping mode atomic force microscopy (AFM). lateral resolution for both materials 54±1 nm while vertical 5±1 nm 3±1 nm, PS HIPS, respectively. This difference explained considering different nanomechanical properties polymers. In contrast, HIPS surfaces are more resistant wear induced repetitive “reading” surface structure with AFM tip.
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