The radiative lifetime and quenching of KrF

作者: G. P. Quigley , W. M. Hughes

DOI: 10.1063/1.89873

关键词: ArgonChemistryExcimerKryptonExcitationRadiative transferExcited stateAtomic physicsReaction rate constantQuenching (fluorescence)Physics and Astronomy (miscellaneous)

摘要: Excitation of atomic krypton in the presence molecular fluorine by a wavelength‐selective 2.5‐ns‐long argon excimer photolytic source was used to initiate reaction sequence resulting formation excited KrF. The radiative lifetime KrF* laser transition found be 9 ns at high‐pressure limit. This is good agreement with calculated values. rate constant for two‐body quenching F2 5.7±0.5×10−10 cm3 s−1 and three‐body Kr 2.9±0.3×10−31 cm3 s−1.

参考文章(16)
T. R . Loree, R. C. Sze, D. L. Barker, Efficient Raman shifting of ArF and KrF laser wavelengths Applied Physics Letters. ,vol. 31, pp. 37- 39 ,(1977) , 10.1063/1.89470
P. Jeffrey Hay, Thom. H. Dunning, The electronic states of KrF The Journal of Chemical Physics. ,vol. 66, pp. 1306- 1316 ,(1977) , 10.1063/1.434025
J. E. Velazco, D. W. Setser, Bound–free emission spectra of diatomic xenon halides The Journal of Chemical Physics. ,vol. 62, pp. 1990- 1991 ,(1975) , 10.1063/1.430664
R. Burnham, F. X. Powell, N. Djeu, Efficient electric discharge lasers in XeF and KrF Applied Physics Letters. ,vol. 29, pp. 30- 32 ,(1976) , 10.1063/1.88860
J. R. Murray, H. T. Powell, KrCl laser oscillation at 222 nm Applied Physics Letters. ,vol. 29, pp. 252- 253 ,(1976) , 10.1063/1.89034
C. J. Tracy, H. J. Oskam, Properties of metastable krypton atoms in afterglows produced in krypton and krypton–nitrogen mixtures Journal of Chemical Physics. ,vol. 65, pp. 1666- 1671 ,(1976) , 10.1063/1.433312
C. A. Brau, J. J. Ewing, Emission spectra of XeBr, XeCl, XeF, and KrF Journal of Chemical Physics. ,vol. 63, pp. 4640- 4647 ,(1975) , 10.1063/1.431249
J. A. Mangano, J. H. Jacob, Electron‐beam‐controlled discharge pumping of the KrF laser Applied Physics Letters. ,vol. 27, pp. 495- 498 ,(1975) , 10.1063/1.88547
J. M. Hoffman, A. K. Hays, G. C. Tisone, High power uv noble‐gas‐halide laserf Applied Physics Letters. ,vol. 28, pp. 538- 539 ,(1976) , 10.1063/1.88813