Optical lithography: Lithography at EUV wavelengths
作者： Greg Tallents , Erik Wagenaars , Geoff Pert
关键词: Optics 、 Computational lithography 、 Photolithography 、 Extreme ultraviolet lithography 、 Materials science 、 Optoelectronics 、 Immersion lithography 、 Lithography 、 X-ray lithography 、 Next-generation lithography 、 Maskless lithography
摘要: Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm light sources that could support lithography over the coming decades.
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