Two-step sharpening process for silicon probe in quartz-based atomic force microscopy sensor

作者: Takashi Ichii , Nobumasa Tagai , Kohei Omori , Tatsunori Uchida , Toru Utsunomiya

DOI: 10.7567/JJAP.54.098005

关键词: SiliconMicaAnalytical chemistryOptoelectronicsNon-contact atomic force microscopyRadiusQuartzSharpeningFrequency modulationAqueous solutionMaterials science

摘要: A two-step sharpening process for a Si pillar in quartz tuning fork sensor was developed use frequency modulation atomic force microscopy (FM-AFM). By combining electrochemical etching HF solution and anisotropic KOH solution, the tip radius decreased to 120 nm. The Si-probe-attached showed higher resonance than tungsten-probe attached sensor, which would lead sensitivity. We demonstrated FM-AFM imaging on cleaved mica surface aqueous by using fabricated resolution successfully achieved.

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