Magnetic tunnel junctions with ZnSe barriers

作者: Xin Jiang , Alex F. Panchula , Stuart S. P. Parkin

DOI: 10.1063/1.1630160

关键词: Sputter depositionQuantum tunnellingIon beam sputteringAnalytical chemistryMaterials scienceEvaporation (deposition)Condensed matter physicsVacuum depositionTunnel magnetoresistanceSemiconductor thin filmsMagnetoresistance

摘要: Magnetic tunnel junctions with ZnSe barriers were fabricated a combination of magnetron sputtering, ion beam and effusion cell evaporation. Tunneling magnetoresistance values ∼10% are observed at room temperature. The temperature barrier thickness dependences the junction resistance tunneling consistent predominant direct mechanism when is less than ∼10 nm thick.

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