Source polarization optimization
作者： Luoqi Chen
DOI:
关键词: Acoustics 、 Polarization (waves) 、 Aerial image 、 Lithography 、 Mathematics 、 Optics
摘要: A lithographic simulation process is described, where each source point in a preselected group of points at pupil plane an illumination represented by one or more variable parameters, wherein least some the parameters characterize polarization state point. One both and representation design layout are iteratively reconfigured based on computed gradient cost function with respect to until desired response obtained, comprises aerial image intensity projected using points. Physical hardware implement variation also described.
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