SYSTEM FOR PRODUCING STRUCTURES IN A SUBSTRATE

Martin Endres, Ralf Stuetzle, Michael Layh, Jens Ossmann, Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus ,(2010)

Markus Deguenther, Michael Layh, Method for adjusting an illumination system of a projection exposure apparatus for projection lithography ,(2012)

Luoqi Chen, Source polarization optimization ,(2011)

Eric B. Catey, Richard C. Zimmerman, Roberto B. Wiener, Alexander C. Kremer, David A. Hult, Heine Melle Mulder, Hendrikus Robertus Marie Van Greevenbroek, System and method for uniformity correction ,(2005)

Markus Degünther, Michael Patra, Mask and scanning projection exposure method for microlithography ,(2011)

Patra Michael, Illumination optics of optical system used in scanner for performing microlithography, has lighting channels whose total intensity in region of optical field is adapted by tilting specific number of individual mirrors to preset value ,(2013)

Martin Bloecker, Gerd Ballhorn, Jens Schneider, Correcting mask structures involves dividing structure into sub-structures, determining correction parameter per sub-structure, applying associated correction parameter to each sub-structure ,(2002)

Andreas Dorsel, Michael Patra, Markus Degünther, Method for exposing photosensitive layer for projection exposure system, involves supplementary-exposing photosensitive layer with supplementary exposure radiation with wavelength for producing intensity distribution on photosensitive layer ,(2011)