Chemical deposition of Al2O3 thin films on Si substrates

作者: P. Vitanov , A. Harizanova , T. Ivanova , T. Dimitrova

DOI: 10.1016/J.TSF.2009.02.085

关键词: Fourier transform infrared spectroscopyThin filmChemistrySpin coatingFourier transform spectroscopySiliconElectrical measurementsAnalytical chemistryAnnealing (metallurgy)OptoelectronicsCoating

摘要: … 2 O 3 thin films prepared by sol–gel technique as a function of annealing temperature. The films … their electrical properties were studies by incorporation of Al 2 O 3 films in MIS structure. …

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