Antireflection sub-wavelength gratings fabricated by spin-coating replication
作者： Y. Kanamori , E. Roy , Y. Chen
DOI: 10.1016/J.MEE.2004.12.039
关键词: Electron-beam lithography 、 Transmittance 、 Materials science 、 Nanolithography 、 Spin coating 、 Grating 、 Nanoimprint lithography 、 Rigorous coupled-wave analysis 、 Reactive-ion etching 、 Optics
摘要: We fabricated an antireflection subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) by spin-coating replication technique. Silicon molds of two-dimensional tapered 200nm period and 90nm deep have been obtained using electron beam lithography reactive ion etching. Replication has done direct [email protected] thick PMMA the mold, followed appropriate mounting glass substrate. The transmittance in wavelength region ranging from 500 to 800nm was measured compared with calculation results basis rigorous coupled-wave analysis. At these wavelengths, SWG increased comparison that flat sheet, good agreement theoretical calculations.
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