An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

摘要: An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed islands through thermodynamic action of dewetting Oswald ripening. The average size coverage rate increased with concentration in range 50–90 nm 40–65%, respectively. critically affected spin speed. effects these two parameters investigated, after etching wet removal residues. reflection nearly disappeared ultraviolet wavelength 17% a bare silicon wafer visible range.