A Kinetic Model for Redox Replacement of UPD Layers
作者： N. Dimitrov , R. Vasilic , N. Vasiljevic
DOI: 10.1149/1.2735817
关键词: Redox 、 Kinetics 、 Metal 、 Inorganic chemistry 、 Nanotechnology 、 Noble metal 、 Adsorption 、 Materials science 、 Electrochemistry 、 Single displacement reaction 、 Stripping (chemistry)
摘要: The redox replacement at open-circuit potential OCP of the underpotentially deposited UPD metal layer in presence ofoxygen and/or more noble ions is discussed and an analytical model describing this process proposed. modelestablishes a functional relationship between time during featuring eitherLangmuir- or Frumkin-type adsorption behavior. A validation performed by fitting experimental transients foroxidative Pb stripping from Cu 111 Ag substrates. excellent agreement theory experiment enablesquantitative prediction control reaction kinetics wide variety systems.© 2007 Electrochemical Society. DOI: 10.1149/1.2735817 All rights reserved.Manuscript submitted February 7, 2007; revised manuscript received March 8, 2007. Available electronically May 9,
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