Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach
作者： Jing Zhao , Henry O. Marcy , Lauren M. Tonge , Bruce W. Wessels , Tobin J. Marks
DOI: 10.1016/0038-1098(90)90716-O
关键词: Thin film 、 Analytical chemistry 、 Plasma-enhanced chemical vapor deposition 、 Pulsed laser deposition 、 Hybrid physical-chemical vapor deposition 、 Combustion chemical vapor deposition 、 Chemistry 、 Plasma processing 、 Carbon film 、 Chemical vapor deposition
摘要: A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For grown under a direct glow, phase not produced in asdeposited state. However, when plasma-activated nitrous oxide used as reactant gas downstream reactor configuration, superconducting are formed situ at substrate temperature 610°C. Such have low carbon content and mirror-like surface which free voids. These preliminary results indicate that fabrication high-Tc by feasible.
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