Superconducting YBa2Cu3O7-x thin films prepared by DC plasma chemical vapour deposition

作者: W N Kang , Y S Yoon , S S Yom

DOI: 10.1088/0953-2048/7/6/001

关键词:

摘要: YBa2Cu3O7-x superconducting thin films were grown on polycrystalline yttria-stabilized zirconia (p-YSZ) and single-crystalline SrTiO3 substrates by DC plasma-assisted metallorganic chemical vapour deposition. A plasma was generated in the reaction chamber applying a potential of 200 V at current 2 mA. The as-deposited an substrate temperature 730 degrees C show sharp resistive transition Tc,zero=88 K. We that deposition is useful to obtain with c axis normal p-YSZ substrates.

参考文章(17)
Y. Q. Li, J. Zhao, C. S. Chern, W. Huang, G. A. Kulesha, P. Lu, B. Gallois, P. Norris, B. Kear, F. Cosandey, High critical current densities in YBa2Cu3O7−xthin films formed by metalorganic chemical vapor deposition at 730 °C Applied Physics Letters. ,vol. 58, pp. 648- 650 ,(1991) , 10.1063/1.104557
C. S. Chern, J. Zhao, Y. Q. Li, P. Norris, B. Kear, B. Gallois, Z. Kalman, Epitaxial thin films of YBa2Cu3O7−xon LaAlO3substrates deposited by plasma‐enhanced metalorganic chemical vapor deposition Applied Physics Letters. ,vol. 58, pp. 185- 187 ,(1991) , 10.1063/1.104973
Jing Zhao, Henry O. Marcy, Lauren M. Tonge, Bruce W. Wessels, Tobin J. Marks, Carl R. Kannewurf, Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach Solid State Communications. ,vol. 74, pp. 1091- 1094 ,(1990) , 10.1016/0038-1098(90)90716-O
J. Zhao, Y. Q. Li, C. S. Chern, P. Lu, P. Norris, B. Gallois, B. Kear, F. Cosandey, X. D. Wu, R. E. Muenchausen, S. M. Garrison, High‐quality YBa2Cu3O7−x thin films by plasma‐enhanced metalorganic chemical vapor deposition at low temperature Applied Physics Letters. ,vol. 59, pp. 1254- 1256 ,(1991) , 10.1063/1.105468
J. Zhao, D. W. Noh, C. Chern, Y. Q. Li, P. Norris, B. Gallois, B. Kear, Low‐temperature in situ formation of Y‐Ba‐Cu‐O high Tc superconducting thin films by plasma‐enhanced metalorganic chemical vapor deposition Applied Physics Letters. ,vol. 56, pp. 2342- 2344 ,(1990) , 10.1063/1.103249
Nobuyuki Sugii, Kazushige Imagawa, Sakae Saito, Keiichi Kanehori, Spectroscopic Study on Plasma-Enhanced Chemical Vapor Deposition of YBa2Cu3OxSuperconducting Thin Films Japanese Journal of Applied Physics. ,vol. 30, pp. 48- 51 ,(1991) , 10.1143/JJAP.30.48
R. Hiskes, S. A. DiCarolis, J. L. Young, S. S. Laderman, R. D. Jacowitz, R. C. Taber, Single source metalorganic chemical vapor deposition of low microwave surface resistance YBa2Cu3O7 Applied Physics Letters. ,vol. 59, pp. 606- 607 ,(1991) , 10.1063/1.105400
Kenkichiro Kobayashi, Satoshi Ichikawa, Genji Okada, Preparation of Superconducting Bi-Sr-Ca-Cu-O Films by Plasma-Assisted Organometallic Chemical Vapor Deposition Japanese Journal of Applied Physics. ,vol. 28, ,(1989) , 10.1143/JJAP.28.L2165
S. Yugo, T. Kanai, T. Kimura, T. Muto, Generation of diamond nuclei by electric field in plasma chemical vapor deposition Applied Physics Letters. ,vol. 58, pp. 1036- 1038 ,(1991) , 10.1063/1.104415
C. S. Chern, J. Zhao, Y. Q. Li, P. Norris, B. Kear, B. Gallois, Insitugrowth of YBa2Cu3O7−xhighTcsuperconducting thin films directly on sapphire by plasma‐enhanced metalorganic chemical vapor deposition Applied Physics Letters. ,vol. 57, pp. 721- 723 ,(1990) , 10.1063/1.104258