Spectroscopic Study on Plasma-Enhanced Chemical Vapor Deposition of YBa2Cu3OxSuperconducting Thin Films
作者： Nobuyuki Sugii , Kazushige Imagawa , Sakae Saito , Keiichi Kanehori
DOI: 10.1143/JJAP.30.48
关键词:
摘要: The effect of plasma enhancement on the chemical vapor deposition YBa2Cu3Ox thin films is investigated using optical emission spectroscopy. Emission due to π* excitation organometallic complexes observed at 316 nm. On other hand, oxygen atoms or ions not observed. High pressure and coexistence Ar gas are thought be reason for this result. intensity increases as microwave power increases. Since crystallinity grown improved with increasing power, have an enhancing crystallization.
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