作者: F. X. Xiu , Z. Yang , L. J. Mandalapu , J. L. Liu , W. P. Beyermann
DOI: 10.1063/1.2170406
关键词: Epitaxy 、 Exciton 、 Dopant 、 Acceptor 、 Optoelectronics 、 Electron diffraction 、 Molecular beam epitaxy 、 Materials science 、 Photoluminescence 、 Doping 、 Analytical chemistry
摘要: Phosphorus-doped p-type ZnO films were grown on r-plane sapphire substrates using molecular-beam epitaxy with a solid-source GaP effusion cell. X-ray diffraction spectra and reflection high-energy electron patterns indicate that high-quality single crystalline (112¯0) obtained. Hall resistivity measurements show the phosphorus-doped have high hole concentrations low resistivities at room temperature. Photoluminescence (PL) 8 K reveal dominant acceptor-bound exciton emission an energy of 3.317 eV. The acceptor level phosphorus dopant is estimated to be 0.18 eV above valence band from PL spectra, which also consistent temperature dependence measurements.