作者: J. M. Bian , X. M. Li , C. Y. Zhang , W. D. Yu , X. D. Gao
DOI: 10.1063/1.1808229
关键词: Seebeck coefficient 、 Scanning electron microscope 、 Doping 、 Photoluminescence 、 Analytical chemistry 、 Thermoelectric effect 、 Wide-bandgap semiconductor 、 Electrical resistivity and conductivity 、 X-ray crystallography 、 Materials science
摘要: Nitrogen-doped p-type ZnO (ZnO:N) films have been achieved by ultrasonic spray pyrolysis at atmosphere. The high structural quality of the obtained was confirmed x-ray diffraction, scanning electron microscopy, and photoluminescence spectra. Hall-effect Seebeck-effect measurements indicate that film shows a low resistivity 3.02×10−2Ωcm, carrier concentration 8.59×1018cm−3, mobility 24.1cm2∕Vs, Seebeck coefficient 408.2μV∕K room temperature. Furthermore, two-layer structured p–n homojunctions were prepared depositing n-type layer on ZnO:N layer. current–voltage curve derived from structure clearly typical rectifying characteristic junctions.