Method for processing target object
作者： Yoshihide Kihara , Masanobu Honda , Tomoyuki Oishi , Toru Hisamatsu
DOI:
关键词: Etching (microfabrication) 、 Process (computing) 、 Object (computer science) 、 Control engineering 、 Oxygen gas 、 Process engineering 、 Chemistry
摘要: A method for processing a target object includes formation step of forming silicon oxide film in chamber by repeatedly executing sequence including first supplying gas containing aminosilane-based gas, second purging space the after step, third generating plasma oxygen and fourth step. The further preparation executed before is accommodated performing an etching process on object. performed In not generated.
lens.org 参考文章(39)
Fumitoshi Kumagai, Taichi Hirano, Power supply system, plasma etching apparatus, and plasma etching method ,(2013)
Harmeet Singh, Saurabh J. Ullal, Shibu Gangadharan, In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control ,(2003)
Kazuki Narishige, Hidetami Yaegashi, Yoshiki Igarashi, Takahito Mukawa, Method of forming mask pattern and method of manufacturing semiconductor device ,(2011)
Jen-Jiang Lee, Hoang Khac Nguyen, Yong Limb, Bich-Yen Nguyen, Philip J. Tobin, Process for forming high purity thin films ,(1990)
Hiromasa Mochiki, Shin Okamoto, Takashi Nishijima, Fumio Yamazaki, Etching processing method ,(2010)
Reiji Niino, Mitsuaki Iwashita, Pao-Hwa Chou, Kazuhide Hasebe, Shigeru Nakajima, Micro pattern forming method ,(2011)
Joo-Won Lee, Jae-Eun Park, Jong-Ho Yang, Kang-soo Chu, Method of forming fine patterns using silicon oxide layer ,(2003)
Julien Beynet, Patrick Wong, Andy Miller, Sabrina Locorotondo, Diziana Vangoidsenhoven, Tae-Ho Yoon, Marc Demand, Hyung-Sang Park, Tom Vandeweyer, Hessel Sprey, Yong-Min Yoo, Mireille Maenhoudt, Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP) Lithography Asia 2009. ,vol. 7520, ,(2009) , 10.1117/12.836979
Pieter C. Rowlette, Marilou Canon, Colin A. Wolden, Digital Control of SiO2 Film Deposition at Room Temperature Journal of Physical Chemistry C. ,vol. 113, pp. 6906- 6909 ,(2009) , 10.1021/JP902122G
Pramod Subramonium, Mandyam Sriram, Jon Henri, Vishwanathan Rangarajan, Shankar Swaminathan, Kirthi K. Kattige, Andrew J. McKerrow, Bart J. van Schravendijk, Dennis M. Hausmann, Plasma activated conformal dielectric film deposition ,(2011)