Power supply system, plasma etching apparatus, and plasma etching method
作者： Fumitoshi Kumagai , Taichi Hirano
DOI:
关键词: Capacitive power supply 、 Power supply unit 、 Power supply rejection ratio 、 Electrical engineering 、 AC adapter 、 Materials science 、 Charge pump 、 Switched-mode power supply 、 Switched-mode power supply applications 、 Power factor
摘要: A power supply system 90 includes high frequency supplies 92 and 93 that a for plasma generation; DC 91 voltage to be applied an electrode; control unit 94 controls the including first 101 negative V 1 , second 102 2 having higher absolute value than selecting circuit 103 selectively connects discharging 104 connected with node 109 between 103.
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