Plasma treatment apparatus having a workpiece-side electrode grounding circuit
作者： Satoru Kawakami , Kenji Ishikawa , Yoichi Deguchi , Shiro Koyama
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摘要: A static chuck and a workpiece push-up pin are disposed on susceptor which is one of opposed electrodes generating plasma. The the electrically connected. grounding circuit discharges electric charges remaining in parallel with an RF power supply supplies to susceptor. Thus, can be discharged abnormal discharging between prevented.
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