Mount for supporting substrates and plasma processing apparatus using the same
作者： Kazuo Fukasawa , Junichi Arami , Takashi Ito
DOI:
关键词: Plasma processing 、 Radius 、 Mount 、 Wafer 、 Plasma etching 、 Curvature 、 Susceptor 、 Electrical engineering 、 Electrical conductor 、 Materials science 、 Optics
摘要: A wafer mount is arranged in a process chamber of the plasma etching apparatus. The rim section susceptor which serves as body curved at large curvature radius. An electrostatic chuck sheet on top and its downward along susceptor, departing from marginal portion semiconductor mounted thereon it comes outward. can be thus shortened horizontal direction this enables conductive film to made longer same direction. thermal connection enhanced.
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