Parallel-plate electrode plasma reactor having an inductive antenna coupling power through a parallel plate electrode
作者： Kenneth S. Collins
DOI:
关键词: Enclosure 、 Base (geometry) 、 Antenna (radio) 、 Optoelectronics 、 Electrode 、 Electrical engineering 、 Plasma 、 Window (computing) 、 Chemistry 、 Coupling 、 Semiconductor
摘要: The invention is embodied by a plasma reactor for processing workpiece, including enclosure defining chamber, semiconductor window, base within the chamber supporting workpiece during thereof, gas inlet system admitting precursor into and an inductive antenna adjacent side of window opposite coupling power interior through electrode.
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