作者: Seuk Hwan Park , Min Ho Kim , You Min Cha
DOI:
关键词: Deposition (phase transition) 、 Optoelectronics 、 Engineering 、 Shutter 、 Deposition chamber 、 Computer hardware 、 Deposition process 、 Substrate (printing) 、 Base (geometry)
摘要: A deposition apparatus includes sources, a chamber, mask assembly, and transfer unit. The assembly support member, shutter drive member. member has first opening configured to allow the materials pass through while supporting base substrate on which passed-through are deposited. is accommodated in second smaller than opening. change position of with respect accordance movement assembly.