Arrangement for cleaning semiconductor wafers using mixer
作者： Noriyoshi Mashimo , Katsuya Okumura
DOI:
关键词: Line (electrical engineering) 、 Semiconductor 、 Wafer 、 Waste management 、 Materials science
摘要: For cleaning semiconductor wafers in a vessel by supplying fluid through supply line thereto, mixer is provided. Deionized water supplied to the deionized line, and gas thereto from reservoir produce fluid. After treating with fluid, rinse them.
lens.org 参考文章(11)
Allan M. Fetty, Continuous ionizer for semiconductor manufacturing processes ,(1985)
Wayne F. Erwin, Flushing system for a meter-mix-dispensing device ,(1982)
John V. Rogers, Martin J. Gough, Insert for placement in a vessel and method of forming the insert ,(1982)
Robert W. Stoll, Ronald H. Wilson, Michael R. MacLaury, Enhancing the selectivity of tungsten deposition on conductor and semiconductor surfaces ,(1984)
Alan E. Walter, Christopher F. McConnell, Process and apparatus for treating wafers with process fluids ,(1985)
Navjot Chhabra, Loyal Gibbons, Hydrofluoric acid etcher and cascade rinser ,(1990)
John Lunt, Random packing medium ,(1973)
Lerner Bernard J, PACKUNGSKOLONNE ZUM MASSEN- BZW. WAERMEAUSTAUSCH ,(1976)
Inouchi Makoto, SEMICONDUCTOR WAFER WASHING EQUIPMENT ,(1987)
Tsuji Mikio, CLEANING OF SEMICONDUCTOR SUBSTRATE ,(1990)