Oxidation resistance of Mo(Si1−xAlx)2 nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy
作者： Jiang Xu , ZhengYang Li , Paul Munroe , Zong-Han Xie
DOI: 10.1039/C4RA10570B
关键词: Chemical engineering 、 Electrochemistry 、 Dielectric spectroscopy 、 Glow discharge 、 Spectroscopy 、 Layer (electronics) 、 Alloy 、 Metallurgy 、 Oxide 、 Nanocrystalline material 、 Materials science
摘要: To explore the influence of Al alloying on oxidation resistance MoSi2, four Mo(Si1−xAlx)2 nanocrystalline films, with differing contents, were fabricated Ti–6A1–4V substrates by a double-cathode glow discharge technique and their cyclic behavior was characterized at 500 °C in air. The kinetics films found to obey subparabolic respect overall exposure, improved additions. On other hand, electrochemical oxide scales developed 3.5 wt% NaCl solution studied using electrochemical-impedance spectroscopy (EIS). impedance data showed that increasing time, transformed from homogeneous dense structure duplex consisting porous outer layer denser inner layer. increased addition, implying an enhanced protective ability media containing chlorine ions. findings represent step forward improving surface integrity alloy components used hot zones jet engines.
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