Patterned chemical etching of high temperature resistant metals

摘要: An improved process for providing a design within metallic surface by composite photoresist techniques in which the has sufficient chemical resistance to permit etching design, with an aqua-regia or fluoride system most commercially available corrosion resistant and high temperature alloys metals. The consists applying first coating of epoxy resin other metal substrate be etched; subsequently conventional material upon cured resin; photomask said desired pattern; exposing light source actuate photoresist; chemically removing non-activated areas; underlying areas preferably means concentrated solution sulfuric acid, dissolves but does not attack thereby same pattern as that developed photoresist, mixture acids capable reacting under reaction conditions chosen, layer.