Methods for sputtering a target material by intermittently applying a voltage thereto and related apparatus, and methods of fabricating a phase-changeable memory device employing the same
作者： Jeong-hee Park , Sung-Lae Cho , Jang-eun Lee
DOI:
关键词: Voltage 、 Polarity (mutual inductance) 、 Optoelectronics 、 Sputtering 、 Materials science 、 Dc bias voltage 、 Substrate (printing) 、 Phase (waves) 、 Ion 、 Electrical engineering 、 Plasma
摘要: A method of sputtering to deposit a target material onto substrate includes supplying an ionized gas the and material. first DC bias voltage having polarity opposite that is applied attract ions theretoward. second intermittently reduce ion accumulation thereon. Related apparatus methods fabricating phase-changeable memory devices are also discussed.
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