Plasma reactor apparatus

摘要: A plasma reactor apparatus providing improved uniformity of etching and having a totally active reaction volume. The is comprised two electrically separated electrodes which bound topmost electrode functions as both gas distribution manifold for uniformly injecting reactant gases into the volume an exhaust withdrawing products from are so configured that takes place only between electrodes; there no inactive space surrounding to fill with plasma. configuration thus conservative reactants energy. bottommost plate serves workpiece holder movable respect upper permit loading unloading workpieces. uppermost RF while maintained at ground potential. has larger area effectively imposes dc offset field enhances decreases undesirable spread undercut etching.