作者: Xuanxuan Chen , Takehito Seo , Paulina Rincon-Delgadillo , Tasuku Matsumiya , Akiya Kawaue
DOI: 10.1117/12.2220420
关键词: Nanotechnology 、 Ionic liquid 、 Free surface 、 Wetting 、 Methacrylate 、 Flory–Huggins solution theory 、 Lithography 、 Chemical engineering 、 Annealing (metallurgy) 、 Materials science 、 Copolymer
摘要: Directed self-assembly of block copolymers is a promising candidate to address grand challenges towards new generations low-cost, high-resolution nanopatterning technology. Over the past decade, poly(styrene-b-methyl methacrylate) (PS-b-PMMA) has been most popular copolymer applied in this area. However, further scaling pitches below 20 nm hindered by its relatively low segregation strength between constituent blocks, characterized Flory-Huggins interaction parameter, χ (~ 0.038 at r.t). To reach sub-10 feature dimensions, many high- materials and processes are currently being studied. Here we investigate DSA PSb- PMMA with blended ionic liquid (IL) on chemically-patterned substrates via thermal annealing free surface. In system, adding volume fraction IL, substantially higher than pure achieved manageable change surface interfacial properties so that poly(styrene-random-methyl brushes may be used control substrate wetting behavior, blend could assembled using other words, PS-b-PMMA/IL serve as drop-in replacement for PS-b-PMMA. work, provide key results determine if blends would offer solution lithography.