Directed self-assembly of PS-b-PMMA with ionic liquid addition

作者: Xuanxuan Chen , Takehito Seo , Paulina Rincon-Delgadillo , Tasuku Matsumiya , Akiya Kawaue

DOI: 10.1117/12.2220420

关键词: NanotechnologyIonic liquidFree surfaceWettingMethacrylateFlory–Huggins solution theoryLithographyChemical engineeringAnnealing (metallurgy)Materials scienceCopolymer

摘要: Directed self-assembly of block copolymers is a promising candidate to address grand challenges towards new generations low-cost, high-resolution nanopatterning technology. Over the past decade, poly(styrene-b-methyl methacrylate) (PS-b-PMMA) has been most popular copolymer applied in this area. However, further scaling pitches below 20 nm hindered by its relatively low segregation strength between constituent blocks, characterized Flory-Huggins interaction parameter, χ (~ 0.038 at r.t). To reach sub-10 feature dimensions, many high- materials and processes are currently being studied. Here we investigate DSA PSb- PMMA with blended ionic liquid (IL) on chemically-patterned substrates via thermal annealing free surface. In system, adding volume fraction IL, substantially higher than pure achieved manageable change surface interfacial properties so that poly(styrene-random-methyl brushes may be used control substrate wetting behavior, blend could assembled using other words, PS-b-PMMA/IL serve as drop-in replacement for PS-b-PMMA. work, provide key results determine if blends would offer solution lithography.

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