Chemical deposition on aerosol particles

作者: V. V. Levdanskii , J. Smolik , P. Moravec , V. Zdimal

DOI: 10.1023/A:1016809610988

关键词: Allowance (engineering)Chemical physicsImpurityChemical depositionAerosolMaterials science

摘要: Problems on the growth of aerosol particles in chemical deposition with allowance for influence a buffer (impurity) gas have been investigated theoretically.

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