Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold
作者： Suk Won Lee , Jung Woo Park , Jung Woo Seo , Sin Kwon , Jeong Gil Kim
DOI:
关键词: Pressing 、 Resist 、 Mold 、 Nanotechnology 、 Image stitching 、 Engraving 、 Micro pattern 、 Coating 、 Composite material 、 Materials science
摘要: Disclosed are a mask mold, manufacturing method thereof, and for forming large-sized micro pattern using the manufactured in which size of nano-level can be enlarged simple with low cost interference stitching errors between cells large area minimized. The mold includes operations coating resist on or plurality small molds having an engraved pattern, pressing to imprint resist, curing releasing from resist.
lens.org 参考文章(6)
Xing Cheng, Lingjie J. Guo, Combined nanoimprinting and photolithography for micro and nano devices fabrication ,(2004)
Nobuhito Suehira, Junichi Seki, Mold, imprint apparatus, and process for producing structure ,(2006)
Jin Sung Kim, Ki Dong Lee, Seh Won Ahn, Joo Do Park, Sang Soo Yoon, Sung Eun Lee, Wire grid polarizer and manufacturing method thereof ,(2004)
Takashi Sato, Attenuated phase-shifting mask with opaque reticle alignment marks ,(1994)
Massimo De Vittorio, Dario Pisignano, Giuseppe Gigli, Maria Teresa Todaro, Sergio Bernardi, Roberto Cingolani, Method for fabricating masters for imprint lithography and related imprint process ,(2004)
Dahl Young Khang, Hong Hie Lee, Method for forming a micro-pattern on a substrate ,(2000)