Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
作者： Saša Bajt , Henry N. Chapman , Nhan Nguyen , Jennifer Alameda , Jeffrey C. Robinson
DOI: 10.1364/AO.42.005750
关键词: X-ray optics 、 Layer (electronics) 、 Extreme ultraviolet lithography 、 Optics 、 Optoelectronics 、 Extreme ultraviolet 、 Synchrotron radiation 、 Lithography 、 Ptychography 、 Reflectivity 、 Materials science
摘要: Multilayer lifetime has emerged as one of the major issues for commercialization extreme-ultraviolet lithography (EUVL). We describe performance an oxidation-resistant capping layer Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable EUVL projection optics and been tested with accelerated electron-beam (EUV) light water-vapor environment. Based on exposure results, we calculated multilayer lifetimes all reflective mirrors typical commercial tool concluded Ru-capped have ∼40× longer than Si-capped multilayers, translates to 3 months many years, depending mirror dose.
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