Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator

作者: Fang Rong Hu , Yi Xian Qian , Jun Hao Niu , Li Juan Zhang , Kun Nie

DOI: 10.4028/WWW.SCIENTIFIC.NET/AMR.317-319.1677

关键词: ZemaxStress (mechanics)Surface flatnessStrehl ratioSpatial light modulatorRadiusOpticsPhysicsCurvatureMicroelectromechanical systems

摘要: In this paper, the effect of resident stress on surface flatness and aberration correction ability spatial light modulator (SLM) is studied. An optical simulation model based ZEMAX software presented to calculate Strehl ratio SLM. The result shows that decrease curvature radius can in ability. Moreover, tensile compressive have same change ratio.

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