Rapid thermal annealing of polysilicon thin films

作者: Xin Zhang , Tong-Yi Zhang , Man Wong , Yitshak Zohar

DOI: 10.1109/84.735342

关键词:

摘要: … Two kinds of annealing treatment were employed in this work: rapid thermal annealing and regular FA. For the rapid thermal annealing, the samples were annealed in a novel radio …

参考文章(27)
L.S. Fan, R.S. Muller, As-deposited low-strain LPCVD polysilicon IEEE Technical Digest on Solid-State Sensor and Actuator Workshop. pp. 55- 58 ,(1988) , 10.1109/SOLSEN.1988.26432
Lj. Ristic, M.L. Kniffin, R. Gutteridge, H.G. Hughes, Properties of polysilicon films annealed by a rapid thermal annealing process Thin Solid Films. ,vol. 220, pp. 106- 110 ,(1992) , 10.1016/0040-6090(92)90556-Q
D Maier-Schneider, J Maibach, E Obermeier, D Schneider, Variations in Young's modulus and intrinsic stress of LPCVD-polysilicon due to high-temperature annealing Journal of Micromechanics and Microengineering. ,vol. 5, pp. 121- 124 ,(1995) , 10.1088/0960-1317/5/2/016
T. Ito, S. Hijiya, T. Nozaki, H. Arakawa, M. Shinoda, Y. Fukukawa, Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen Journal of The Electrochemical Society. ,vol. 125, pp. 448- 452 ,(1978) , 10.1149/1.2131471
Ernst Lüder, Polycrystalline silicon-based sensors Sensors and Actuators. ,vol. 10, pp. 9- 23 ,(1986) , 10.1016/0250-6874(86)80032-4
Michael W. Putty, Shih-Chia Chang, Roger T. Howe, Andrew L. Robinson, Kensald D. Wise, Process Integration for active polysilicon resonant microstructures Sensors and Actuators. ,vol. 20, pp. 143- 151 ,(1989) , 10.1016/0250-6874(89)87112-4
P. Krulevitch, Tai D. Nguyen, G. C. Johnson, R. T. Howe, H. R. Wenk, R. Gronsky, Lpcvd Polycrystalline Silicon Thin Films: The Evolution of Structure, Texture and Stress MRS Proceedings. ,vol. 202, pp. 167- ,(1990) , 10.1557/PROC-202-167
R. T. Howe, R. S. Muller, Polycrystalline Silicon Micromechanical Beams Journal of The Electrochemical Society. ,vol. 130, pp. 1420- 1423 ,(1983) , 10.1149/1.2119965
William D. Nix, Mechanical properties of thin films Metallurgical and Materials Transactions A-physical Metallurgy and Materials Science. ,vol. 20, pp. 2217- 2245 ,(1989) , 10.1007/BF02666659