作者: X.P. Guo , L.X. Zhao , Ping Guan , K. Kusabiraki
DOI: 10.4028/WWW.SCIENTIFIC.NET/MSF.561-565.371
关键词: Microstructure 、 Materials science 、 Composite material 、 Cementation (metallurgy) 、 Metallurgy 、 Perpendicular 、 Equiaxed crystals 、 Coating 、 Oxidation resistant 、 Alloy 、 Silicide
摘要: The halide-activated pack cementation method was utilized to deposit silicide coatings on a multicomponent Nb-Ti-Si based alloy. siliconized temperature 1150 °C and the holding time 10h. Both specimens with without were oxidized at 1250°C for 5, 10, 20, 50 100h respectively. coating possessed double layer structure composition of (Nb,X)Si2 (X represents Ti, Cr Hf), outer denser. major in composed columnar crystals perpendicular interface between substrate, that inner mainly equiaxed crystals. A transitional about 5μm thick found substrate. After oxidation 1250°C, constituents scale SiO2 TiO2 mole ratio these two phases 2:1. thickness decreased increased as prolonged. exhibited excellent oxidation-resistance within hours.