Structure and oxidation behavior of Si-Y co-deposition coatings on an Nb silicide based ultrahigh temperature alloy prepared by pack cementation technique
作者： Xiaodong Tian , Xiping Guo
DOI: 10.1016/J.SURFCOAT.2009.07.031
关键词: Metallurgy 、 Coating 、 Intermediate layer 、 Alloy 、 Oxidation rate 、 Silicide 、 Co deposition 、 Composite material 、 Materials science 、 Solid solution 、 Cementation (metallurgy)
摘要: Abstract In order to improve the oxidation resistance of silicide coatings on Nb based alloys, Y-modified were prepared by co-depositing Si and Y at 1050, 1150 1250 °C for 5–20 h, respectively. It has been found that 1050 1150 °C 5–20 h as well 5 h composed a thick (Nb,X)Si2 (X represents Ti, Cr Hf elements) outer layer thin (Nb,X)5Si3 inner layer, while 10–20 h possessed (Ti,Nb)5Si3 Ti-based solid solution, intermediate layer. EDS analyses revealed content in layers all was about 0.34–0.58 at.% 1.39–1.88 at.%. The specimens treated 10 h selected test. behavior coating indicated Si–Y co-deposition had better than simple siliconized because rate constant lower 31%. scale developing consisted thicker SiO2 TiO2 thinner
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