Characterization of structure and distortion in the manganese ions implanted TiO2 thin films
作者： Peng Ding , Fa-Min Liu , Xin-An Yang , Jian-Qi Li
DOI: 10.1016/J.NIMB.2009.06.031
关键词: X-ray photoelectron spectroscopy 、 High-resolution transmission electron microscopy 、 Cobalt 、 Analytical chemistry 、 Scanning electron microscope 、 Materials science 、 Annealing (metallurgy) 、 Metallurgy 、 Anatase 、 Thin film 、 Sputter deposition
摘要: TiO2 thin films were prepared by direct current magnetron sputtering on glass substrates, then implanted cobalt ions, and finally annealed at 400 500 degrees C for 50 min, respectively. They identified as an anatase structure X-ray diffraction (XRD). Scanning electron microscope (SEM) images showed that the grain sizes of grow with increasing annealing temperature. The energy dispersive (EDX) measurements indicated ratio atoms number total titanium in Co-TiO2 was about 2.51%, photoelectron spectroscopy (XPS) results revealed existed Co2+. element distribution along cross-section studied EDX, diffused deeply into after annealing. high resolution transmission microscopy (HRTEM) used to affirm films, edge dislocations further found HRTEM images, which could be attributed effect implantation. (C) 2009 Elsevier B.V. All rights reserved.
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