Chemical vapor deposition reactor having multiple inlets
作者： Heng Liu
DOI:
关键词: Chemistry 、 Wafer 、 Nuclear engineering 、 Flow (psychology) 、 Waste management 、 Chemical vapor deposition 、 Laminar flow 、 Injector 、 Inlet
摘要: A chemical vapor deposition reactor has a wafer carrier which cooperates with chamber of the to facilitate laminar flow reaction gas within and plurality injectors configured in controllable zones so as mitigate depletion.
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