High speed volumetric thickness profile measurement based on full-field wavelength scanning interferometer.

作者: Jang-Woo You , Soohyun Kim , Daesuk Kim

DOI: 10.1364/OE.16.021022

关键词: WavelengthWhite light interferometryMichelson interferometerOpticsReflection coefficientMaterials scienceDigital holographyFresnel equationsInterferometryProfilometer

摘要: A novel high speed volumetric thickness profilometry based on a wavelength scanning full-field interferometer and its signal processing algorithm is described for thin film deposited pattern structures. specially designed Michelson with blocking plate in the reference path enables us to measure profile by decoupling two variables, profile, which affect total phase function phi(k). We show experimentally that proposed method provides much faster solution obtaining data while maintaining similar level of accurate measurement capability as least square fitting method.

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